The Resource Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld
Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld
Resource Information
The item Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in Indiana State Library.This item is available to borrow from 1 library branch.
Resource Information
The item Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld represents a specific, individual, material embodiment of a distinct intellectual or artistic creation found in Indiana State Library.
This item is available to borrow from 1 library branch.
- Language
- eng
- Extent
- 3 pages
- Note
-
- Caption title
- At head of title: Project summary
- Distributed to depository libraries in microfiche
- "July 1985."
- "EPA/600/S3-85/042."
- Label
- Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters
- Title
- Evaluation of chemical reaction mechanisms for photochemical smog
- Title number
- part III
- Title part
- Sensitivity of EKMA to chemical mechanism and input parameters
- Statement of responsibility
- Toby B. Shafer and John H. Seinfeld
- Language
- eng
- Cataloging source
- GPO
- http://library.link/vocab/creatorName
- Shafer, Toby B
- Government publication
- federal national government publication
- Index
- no index present
- Literary form
- non fiction
- http://library.link/vocab/relatedWorkOrContributorName
-
- Seinfeld, John H
- Atmospheric Sciences Research Laboratory
- http://library.link/vocab/subjectName
-
- Chemical reactions
- Hydrocarbons
- Ozone
- Photochemical smog
- Label
- Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld
- Note
-
- Caption title
- At head of title: Project summary
- Distributed to depository libraries in microfiche
- "July 1985."
- "EPA/600/S3-85/042."
- Carrier category
- volume
- Carrier category code
- nc
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
- txt
- Content type MARC source
- rdacontent
- Control code
- 17130654
- Dimensions
- 28 cm
- Extent
- 3 pages
- Media category
- unmediated
- Media MARC source
- rdamedia
- Media type code
- n
- Label
- Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld
- Note
-
- Caption title
- At head of title: Project summary
- Distributed to depository libraries in microfiche
- "July 1985."
- "EPA/600/S3-85/042."
- Carrier category
- volume
- Carrier category code
- nc
- Carrier MARC source
- rdacarrier
- Content category
- text
- Content type code
- txt
- Content type MARC source
- rdacontent
- Control code
- 17130654
- Dimensions
- 28 cm
- Extent
- 3 pages
- Media category
- unmediated
- Media MARC source
- rdamedia
- Media type code
- n
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.in.gov/portal/Evaluation-of-chemical-reaction-mechanisms-for/dscNjIxod8k/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.in.gov/portal/Evaluation-of-chemical-reaction-mechanisms-for/dscNjIxod8k/">Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.in.gov/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.in.gov/">Indiana State Library</a></span></span></span></span></div>
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<div class="citation" vocab="http://schema.org/"><i class="fa fa-external-link-square fa-fw"></i> Data from <span resource="http://link.library.in.gov/portal/Evaluation-of-chemical-reaction-mechanisms-for/dscNjIxod8k/" typeof="Book http://bibfra.me/vocab/lite/Item"><span property="name http://bibfra.me/vocab/lite/label"><a href="http://link.library.in.gov/portal/Evaluation-of-chemical-reaction-mechanisms-for/dscNjIxod8k/">Evaluation of chemical reaction mechanisms for photochemical smog, part III, Sensitivity of EKMA to chemical mechanism and input parameters, Toby B. Shafer and John H. Seinfeld</a></span> - <span property="potentialAction" typeOf="OrganizeAction"><span property="agent" typeof="LibrarySystem http://library.link/vocab/LibrarySystem" resource="http://link.library.in.gov/"><span property="name http://bibfra.me/vocab/lite/label"><a property="url" href="http://link.library.in.gov/">Indiana State Library</a></span></span></span></span></div>
